ИСТИНА

• Охват: Международная
• Даты проведения: 22-23 октября 2015
• Место проведения: Калифорния, United States
• Число участников: 1000
• Число участников из МГУ: 1
• Описание конференции:

  The AVS International Symposium and Exhibition addresses cutting-edge issues associated with materials, processing, and interfaces in the research and manufacturing communities. The weeklong Symposium fosters a multidisciplinary environment that cuts across traditional boundaries between disciplines, featuring papers from AVS technical divisions, technology groups, and focus topics on emerging technologies. The equipment exhibition is one of the largest in the world and provides an opportunity to view the latest products and services offered by 200+ participating companies. More than 2,000 scientists and engineers gather from around the world to attend. Short courses providing specialized training in areas of vacuum science and related technologies will be offered. The Symposium also provides a Career Center available to all attendees. The Career Center covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Career Center provides the opportunity for job seekers to submit their résumés and meet with potential employers. Other symposia features include Tutorials, Professional Leadership opportunities and several related workshops. Registered AVS attendees are invited to visit the exhibit which comprises an extensive display of tools, equipment, services and consulting for film deposition, surface and interface measurements and analysis, materials, chemicals, supplies, vacuum production and measurement, and related instrumentation for surface, interface and film measurements, as well as professional literature and publications in these topics. In addition, consultants, engineers, biologists, chemists, physicists, purchasing professionals, scientists, students, technicians, and exhibitor staff working or studying in the fields of applied surface science, biomaterial interfaces, electronic materials and processing, magnetic interfaces, manufacturing science, MEMS/NEMS, nanoscience, thin film, plasma science, surface science, or vacuum technology can pre-register for the AVS Exhibition for FREE.

• Добавил в систему: Тетерин Юрий Александрович

Доклады:

• 2015 Nature of Chemical Bond in Cs2UO2Cl4. (Стендовый)
• Авторы: Teterin Yu, Teterin A., Ivanov K., Suglobov D., Maslakov K., Kalmykov S., Petrov V., Ryzhkov M.

• 2015 Study of Chemical Bond in Cs2NpO2Cl4 (Стендовый)
• Авторы: Teterin A., Ivanov K., Ryzhkov M., Teterin Yu, Kalmykov S., Petrov V., Suglobov D., Maslakov K.

• 2015 The Study of the Pu6p,5f-Electrons in Cs2PuO2Cl4 (Стендовый)
• Авторы: Teterin Yu, Teterin A., Ivanov K., Suglobov D., Maslakov K., Kalmykov S., Petrov V., Ryzhkov M.