ИСТИНА

• Охват: Международная
• Даты проведения: 10-11 октября 2019
• Место проведения: Токио, Japan
• Организаторы:
  ADMETA Committee
  The Japan Society of Applied Physics
• Число участников из МГУ: 1
• Число докладчиков: 1
• Веб-сайт: http://www.admeta.org/
• Описание конференции:

  The ADMETAPlus is heading for its 29th historical meeting and has a long record of important contributions to practical progress for advanced MPU and various memory devices. In recent years, the importance of interconnect technology for realizing low resistance, large integration, rich functionality, low cost, and high reliability has increased in various device application fields beyond silicon electronics. This conference will focus on interconnects technology and science related to materials, processes, device design, assembly, equipment, cost performance, and characterization. We will host comprehensive discussions on a wide range of topics, establish basics to applications, with researchers and engineers from industry, government, and academia. We are looking forward to new developments in interconnect technology fields and contributing to the growth of semiconductor industry in the Asian area.

• Добавил в систему: Палов Александр Петрович

Доклады:

• 2019 Etching of OSG low-k films in CF4 plasma at different temperatures (Стендовый)
• Авторы: Alexander Palov, Ekaterina Voronina, Tatyana Rakhimova, Olga Proshina, Yuri Mankelevich

• 2019 Sputtering and etching of ethylene bridged low-k films by neutral fluorine (Стендовый)
• Авторы: Alexander Palov, Ekaterina Voronina, Shuhua Wei