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Fabrication of carbon based material with high electron field emission properties was described in papers1, 2, 3. It has been shown that this material called nanocrystalline graphite (NCG) consists of nanosize (5-7nm) graphite crystals (micro-ridges) with length up to several microns. NCG is considered as a promising material for applications in many areas of technology. (f.e.2, 4). In this paper we have investigated electron field emission properties of NCG films, grown by PECVD method on Si substrates (100). Current – Voltage characteristics were measured both in continuous and in pulse-periodic regimes. In the latter case voltage impulse generator with 10-100 μs pulse duration were used. It was shown that grown NCG films allow to achieve a stable current density up to 8 A/cm2 from the surface with area up to 1 cm2. This discovers new perspectives in applications of NCG field emitters. SEM and Raman spectroscopy diagnostics have revealed features in morphology of grown films. More detailed investigation of NCG films morphology has shown that along with the normally oriented to the substrate micro-ridges, films contain carbon whiskers with length considerably higher than of micro-ridges. We have not used metallic catalysts which might cause growth of the nanotubes or nanofibers during the process of NCG films synthesis. In addition to this, XRF study of the NCG films does not reveal metals or any other elements except for the carbon. Thus, it could be concluded that these structures are growing during PECVD processing without any catalyst. References: 1A. T. Rakhimov Phys. Usp. vol. 43 p. 926 (2000). 2H. H. Busta, R. J. Espinosa, A. T. Rakhimov, N. V. Suetin ,et al. Solid-State Electronics,