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A study of the efficiency and accuracy of calculations of the electrostatic energy of atomistic clusters of thin films of silicon dioxide is presented. Electrostatic energy is calculated using the Particle Mesh Ewald method using the GROMACS program. The parallel efficiency is calculated for the number of cores from 8 to 64. The dependence of the results on two main parameters of the Particle Mesh Ewald method - fourierspacing and interpolation order - is studied. It is found that the density profiles of growing films are sensitive to the interpolation order.