ИСТИНА

The contactless nondestructive method for checking and correcting the exposure pattern based upon measurement of the latent image pattern formed in a resist prior to development (figure 1b). The process may be used with various photoresists to form patterns useful as stampers or molds for optical disks, optical cards, diffractive optics and other minute articles. The method includes illumination of the latent image with light which the photoresist is not sensitive to and measurement of the polarization of that light before and after interacting with exposed and unexposed areas of the photoresis