Modeling of local maskless electrochemical deposition of metal microcolumnsстатья
Статья опубликована в высокорейтинговом журнале
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Дата последнего поиска статьи во внешних источниках: 10 августа 2018 г.
Аннотация:The work deals with the problem of fabricating new materials for modern devices of microelectromechanics,
microelectronics, biomimetics, etc. using the local electrodeposition of metals. The mathematical
model is developed for the formation of 3D microstructures (microcolumns) by the local electrochemical
deposition of metal using a moving disk microanode. The numerical solution of the mathematical problem
is performed using the finite element method on the irregular grid. The grid is deformed and adaptively
remeshed during modeling of deposit growth. Evolution of deposit surface is calculated for various
exchange current densities, transfer coefficients, interelectrode distances and various dependences of the
current efficiency on the current density.
The results of modeling allow one to determine the relationships between the parameters of electrodeposition
and the shape and dimensions of formed microstructures. These data can be used to predict the
results of local electrodeposition of metal and to optimize the operation conditions.