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Controlling bridging and pinching with pixel-based mask for inverse lithographyстатья Электронная публикация
Информация о цитировании статьи получена из
Web of Science,
Scopus
Дата последнего поиска статьи во внешних источниках: 19 июля 2016 г.
- Авторы: Кобельков С.Г., Tritchkov Alexander, Han JiWan
- Сборник: SPIE proceedings
- Серия: Metrology, Inspection, and Process Control for Microlithography
- Том: 9778
- Год издания: 2016
- Первая страница: 1
- Последняя страница: 9
- DOI: 10.1117/12.2219281
- Аннотация: Paper Abstract Inverse Lithography Technology (ILT) has become a viable computational lithography candidate in recent years as it can produce mask output that results in process latitude and CD control in the fab that is hard to match with conventional OPC/SRAF insertion approaches. An approach to solving the inverse lithography problem as a nonlinear, constrained minimization problem over a domain mask pixels was suggested in the paper by Y. Granik “Fast pixel-based mask optimization for inverse lithography” in 2006. The present paper extends this method to satisfy bridging and pinching constraints imposed on print contours.
- Добавил в систему: Кобельков Сергей Георгиевич