|
ИСТИНА |
Войти в систему Регистрация |
ИПМех РАН |
||
Microwave Plasma-Activated Chemical Vapour Deposition of Nitrogen-Doped Diamond, I: N2/H2 and NH3/H2статья
Информация о цитировании статьи получена из
Scopus,
Web of Science
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 17 июня 2016 г.
- Авторы: Plasmas Benjamin Truscott S.Journal of, Kelly Mark W., Potter Katie J., Mack Johnson, Ashfold Michael N.R., Mankelevich Yuri A.
- Журнал: The Journal of Physical Chemistry A: Molecules, Clusters, and Aerosols
- Том: 119
- Год издания: 2015
- Издательство: American Chemical Society
- Местоположение издательства: United States
- Первая страница: 12962
- Последняя страница: 12976
- DOI: 10.1021/acs.jpca.5b09077
- Аннотация: We report a combined experimental/modelling study of microwave activated dilute N2/H2 and NH3/H2 plasmas as a precursor to diagnosis of the CH4/N2/H2 plasmas used for the chemical vapour deposition (CVD) of N-doped diamond. Absolute column densities of H(n = 2) atoms and NH(X3−, v = 0) radicals have been determined by cavity ring down spectroscopy, as a function of height (z) above a molybdenum substrate and of the plasma process conditions, i.e. total gas pressure p, input power P and the nitrogen/hydrogen atom ratio in the source gas. Optical emission spectroscopy has been used to investigate variations in the relative number densities of H(n = 3) atoms, NH(A3) radicals, and N2(C3u) molecules as functions of the same process conditions. These experimental data are complemented by 2-D(r, z) coupled kinetic and transport modelling for the same process conditions, including consideration of variations in both the overall chemistry and plasma parameters, including the electron (Te) and gas (T) temperatures, the electron density (ne) and the plasma power density (Q). Comparisons between experiment and theory allow refinement of prior understanding of N/H plasma-chemical reactivity, its variation with process conditions and with location within the CVD reactor, and serve to highlight the essential role of metastable N2(A3Σ+u) molecules (formed by electron impact excitation) and their hitherto under-appreciated reactivity with H atoms, in converting N2 process gas into reactive NHx (x = 0–3) radical species.
- Добавил в систему: Манкелевич Юрий Александрович