Nanovoid formation in polymethylmetacrylate film by swift heavy ion irradiationстатья
Информация о цитировании статьи получена из
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Scopus
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Дата последнего поиска статьи во внешних источниках: 24 января 2020 г.
Авторы:
Privezentsev V.,
Palagushkin A.,
Skuratov V.,
Kulikauskas V.,
Kiselev D.
Аннотация:Single-crystal n-Si(100) wafers are implanted with 64Zn+ ions with an energy of 50 keV and dose of 5 × 1016 cm–2. Then the samples are irradiated with 132Xe26+ ions with an energy of 167 MeV in the range of fluences from 1 × 1012 to 5 × 1014 cm–2. The surface and cross section of the samples are visualized by scanning electron microscopy and transmission electron microscopy. The distribution of implanted Zn atoms is studied by time-of-flight secondary-ion mass spectrometry. After irradiation with Xe, surface pores and clusters consisting of a Zn–ZnO mixture are observed at the sample surface. In the amorphized subsurface Si layer, zinc and zinc-oxide phases are detected. After irradiation with Xe with a fluence of 5 × 1014 cm–2, no zinc or zinc-oxide clusters are detected in the samples by the methods used in the study.