|
ИСТИНА |
Войти в систему Регистрация |
ИПМех РАН |
||
Study of optical properties and surface structure of thin films of nonstoichiometric silicon nitride formed by means of low-temperature plasmachemical deposition for an implementation in MEMS-structuresстатья
Информация о цитировании статьи получена из
Web of Science,
Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 5 августа 2020 г.
- Авторы: Sigarev A.A., Rudakov G.A., Lapshin R.V., Fetisov E.A.
- Журнал: Research Journal of Pharmaceutical, Biological and Chemical Sciences
- Том: 6
- Номер: 1
- Год издания: 2015
- Первая страница: 1815
- Последняя страница: 1825
- Аннотация: In the presented paper optical properties and surface morphology of non-stoichiometric silicon nitride SiNx layers used for manufacturing of heat-sensitive membranes in microelectromechanical systems (MEMS) and microoptomechanical systems (MOMS) are studied using infrared (IR) spectroscopy and atomic-force microscopy (AFM) methods. For model structures "silicon wafer – film of SiNx" and "silicon wafer – film of SiNx – thin metal layer" transmission and reflection spectra in a region of wave numbers of 500-7000 cm-1 are investigated. Aluminum, nickel and nickel-chromium alloy were used for formation of metal coatings. For the studied thin film structures analysis of optical properties appearing in IR spectrum both in a form of selective absorption bands and interference modulations of a base line was carried out. Analysis of AFM images allowed to define parameters of surface roughness of studied samples.
- Добавил в систему: Лапшин Ростислав Владимирович
Прикрепленные файлы
| № | Имя | Описание | Имя файла | Размер | Добавлен |
|---|---|---|---|---|---|
| 1. | Полный текст | A._A._Sigarev_et_al._Study_of_optical_properties_and_surfac… | 1,1 МБ | 31 июля 2020 [Lapshin] |