Large-Scale Laser Fabrication of Antifouling Silicon-Surface Nanosheet Arrays via Nanoplasmonic Ablative Self-Organization in Liquid CS2 Tracked by a Sulfur Dopant

Kudryashov, S.I.; Nguyen, L.V.; Kirilenko, D.A.; Brunkov, P.N.; Rudenko, A.A.; Busleev, N.I.; Shakhmin, A.L.; Semencha, A.V.; Khmelnitsky, R.A.; Melnik, N.N.; Saraeva, I.N.; Nastulyavichus, A.A.; Ionin, A.A.; Tolordava, E.R.; Romanova, Y.M.

Авторы: Kudryashov Sergey I., Nguyen Luong V., Kirilenko Demid A., Brunkov Pavel N., Rudenko Andrey A., Busleev Nikolay I., Shakhmin Alexander L., Semencha Alexander V., Khmelnitsky Roman A., Melnik Nikolay N., Saraeva Irina N., Nastulyavichus Alena A., Ionin Andrey A., Tolordava Eteri R., Romanova Yulia M.
Журнал: ACS Applied Nano Materials
Том: 1
Номер: 6
Год издания: 2018
Издательство: American Chemical Society
Местоположение издательства: United States
Первая страница: 2461
Последняя страница: 2468
DOI: 10.1021/acsanm.8b00392
Аннотация: Large-scale surface nanopatterning of a commercial silicon (Si) wafer in the form of regular 1D arrays of high-aspect-ratio vertical nanosheets (NSs) for antifouling and other potential promising optoelectronic, nanophotonic, and sensing applications was performed via multishot picosecond IRlaser ablation under a 5-mm-thick carbon disulfide liquid layer. Specifically, the nanopatterned surface layer demonstrates the broad ultralow mid-IR transmittance and the high content of sulfur, carbon, and even oxygen in the modified submicron-thick top layer, preventing the appearance of a Staphylococcus aureus bacterial biofilm. High-resolution transmission electron microscopy studies exhibit the anticorrelating inner versus outer surface abundance of donor sulfur versus adverse carbon and oxygen components and the amorphous structure of the sulfur-hyperdoped NSs atop their crystalline basements. These NSs indicate their appearance via the interfacial vapor/ plume bubble-mediated codeposition of Si ablation nanoplumes from the regular trenches and sulfur-containing products of carbon disulfide decomposition in the bubble. Numerical modeling indicates the nanoplasmonic origin of the Si NSs, self-limited in both the 100 nm periods and the submicron heights.
Добавил в систему: Руденко Андрей Андреевич

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Large-Scale Laser Fabrication of Antifouling Silicon-Surface Nanosheet Arrays via Nanoplasmonic Ablative Self-Organization in Liquid CS2 Tracked by a Sulfur Dopantстатья