Optical Chacterization of Plasma Enhanced Chemical Vapor Deposition of Nanocarbon Film Materialsстатья
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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Аннотация:In this paper we describe the optical emission spectroscopy studies of a plasma enhanced chemical vapor deposition of nanostructured carbon films. The nano-carbon films were deposited from a hydrogen-methane gas mixture activated by a direct current discharge. The gas discharge plasma parameters providing a stable synthesis of different carbon films have been determined. The optical emission spectra have been obtained for the discharge plasma at different pressures and gas compositions of the plasma environment. A correlation between a graphite-like structure formation and a presence of carbon dimers; C(2) in the activated gas mixture has been found. A characteristic optical emission of C(2) in swan-band was analyzed to determine a spatial distribution of the carbon dimers in plasma environment.