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Interference in the angular distribution of photoelectrons in superimposed XUV and optical laser fieldsстатья
Статья опубликована в высокорейтинговом журнале
Информация о цитировании статьи получена из
Web of Science,
Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 18 декабря 2013 г.
- Авторы: Duesterer S., Rading L., Johnsson P., Rouzee A., Hundertmark A., Vrakking M.J.J, Radcliffe P., Meyer M., Kazansky A.K., Kabachnik N.M.
- Журнал: Journal of Physics B: Atomic, Molecular and Optical Physics
- Том: 46
- Номер: 16
- Год издания: 2013
- Издательство: IOP Publishing
- Местоположение издательства: [Bristol, UK], England
- Первая страница: 164026-1
- Последняя страница: 164026-6
- DOI: 10.1088/0953-4075/46/16/164026
- Аннотация: The angular distribution of photoelectrons ejected during the ionization of Ne atoms by extreme ultraviolet (XUV) free-electron laser radiation in the presence of an intense near infrared (NIR) dressing field was investigated experimentally and theoretically. A highly nonlinear process with absorption and emission of more than ten NIR photons results in the formation of numerous sidebands. The amplitude of the sidebands varies strongly with the emission angle and the angular distribution pattern reveals clear signatures of interferences between the different angular momenta for the outgoing electron in the multi-photon process. As a specific feature, the central photoelectron line is characterized at the highest NIR fields by an angular distribution, which is peaked perpendicularly to both the XUV and NIR polarization directions. Experimental results are reproduced by a theoretical model based on the strong field approximation.
- Добавил в систему: Кабачник Николай Мартинович