Post-processing and processing treatment and their effect on structure and properties of Finemet filmsстатья
Статья опубликована в высокорейтинговом журнале
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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Аннотация:The effect of heating of substrates (75 degreesC, 110 degreesC, 145 degreesC and 180 degreesC), electrical bias (50, 75, 100, 125, 150, 200 and 250 V) on the substrate during preparation of amorphous films, and post-annealing on structure and properties of Finemet films were studied. Films were obtained by ion-beam sputtering a Fe73.5Si16.5B6Cu1Nb3 alloy. The structural changes of films due to different annealing temperatures were studied by means of transmission electron microscopy (TEM; Philips CM 300) and X-ray diffraction analyzer (DRON-4). Magnetostatic properties measurements were made with the vibrating sample magnetometer (VSM). Annealing after sputtering decreases the coercive force but its magnitude depends on the preparation conditions. We found that film deposition onto heated substrates had a critical temperature between 110 degreesC and 145 degreesC, at which the film had coercivity H-c > 30 Oe. The samples deposited without the bias coercive force decreased after annealing. But the bias voltage during sample preparation reduced this effect of annealing. (C) 2001 Published by Elsevier Science B.V.