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Fabrication of x-ray zone plates by surface-plasma chemical vapor depositionстатья
Статья опубликована в высокорейтинговом журнале
Статья опубликована в журнале из списка Web of Science и/или Scopus- Авторы: Golant K.M., Lavrishchev S.V., Popov A.V., Artyukov I.A., Feshchenko R.M., Mitrofanov A.N., Vinogradov A.V.
- Журнал: Applied optics
- Том: 46
- Номер: 23
- Год издания: 2007
- Издательство: Optical Society of America
- Местоположение издательства: United States
- Первая страница: 5964
- Последняя страница: 5964
- DOI: 10.1364/ao.46.005964
- Аннотация: A new cost-efficient sputter-slice technology for hard x-ray (10–30 keV) Fresnel zone plates fabrication, imposing no limitation to aspect ratio, is proposed. By means of a plasma chemical process, SiO2/Si1−xGexO2 glassy film multilayer structures are deposited on a lateral surface of a silica rod, outermost layers being as thin as 100 nm. It has been shown by numerical simulation that for x=0.2 germanium fraction, 100–300 μm zone plate thickness and the number of zones of about 1000, first order diffraction efficiency as high as 20%–30% at the energy of approximately 20 keV can be achieved.
- Добавил в систему: Артюков Игорь Анатольевич