|
ИСТИНА |
Войти в систему Регистрация |
ИПМех РАН |
||
Dynamics of Plasma in a Dual-Frequency Capacitive Discharge in an Ar/Xe Mixtureстатья
Информация о цитировании статьи получена из
Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 12 июня 2024 г.
- Авторы: Bogdanova M.A., Voloshin D.G., Glotov A.V., Lopaev D.V., Sysoev N.N., Shibanov D.R.
- Журнал: Moscow University Physics Bulletin
- Том: 79
- Номер: 1
- Год издания: 2024
- Издательство: Allerton Press
- Местоположение издательства: New York, N.Y., United States
- Первая страница: 75
- Последняя страница: 81
- DOI: 10.3103/s0027134924700127
- Аннотация: The spatio-temporal dynamics of plasma in a symmetrical dual-frequency 81 MHz/1.76 MHzcapacitive discharge under the influence of a low-frequency 1.76 MHz field has been studied. Using phaseresolved optical emission spectroscopy, the dynamics of argon and xenon emission intensity in the plasma was obtained. Measurements of the electron energy probability function (EEPF) at the center of the discharge were performed using a Langmuir probe, and electron density measurements were made using a hairpin probe. The main result is the dynamics of the intensity ratios of selected argon and xenon lines under different conditions: at pressures of 40, 200, and 400 mTorr, low-frequency voltage amplitudes of100, 200, and 400 V, and input power at 81 MHz of 3 and 15 W. The dynamics of high-energy electronswas investigated based on a two-temperature approximation of the electron energy probability function.
- Добавил в систему: Богданова Мария Андреевна