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Chemical Vapor Deposition of Tantalum Carbide in the TaBr5–CCl4–Cd Systemстатья
- Авторы: Krenicky Tibor, Goncharov Oleg Y., Kuchar Jiri, Sapegina Irina V., Kudlacek Jan, Faizullin Ravil R., Korshunov Alexander I., Cerny Daniel
- Журнал: Coatings
- Том: 14
- Номер: 5
- Год издания: 2024
- Издательство: MDPI
- Местоположение издательства: Basel, Switzerland
- Первая страница: 547
- Последняя страница: 547
- DOI: 10.3390/coatings14050547
- Аннотация: The tantalum carbide coatings were deposited on substrates made of 12Kh18N10T steel,ZhC6 alloy, and molybdenum by reduction of TaBr5 and CCl4 vapors with cadmium vapors attemperatures of 950–1000 K. The average deposition rate of coatings on molybdenum was ~5 μm/h,on ZhC6 alloy was ~6 μm/h, and on 12Kh18N10T steel was ~8 μm/h. The coatings were formed ascolumnar grains on the substrate surface and as a diffuse layer in the substrate material. The surfacelayers contained mainly tantalum monocarbide TaCy (y = 0.72–0.86) and a small fraction of tantalum.The coatings on the surface of ZhC6 alloy and 12Kh18N10T steel flaked off with increasing thickness,which was due to different thermal expansion of the coating and substrate, as well as concentrationinhomogeneity and phase transitions in the substrate material during coating deposition and duringthe heating and cooling processes.
- Добавил в систему: Коршунов Александр Иванович