Synthesis of thin colloidal crystal films and monolayer masks for metal ions implantation

Авторы: Bakhia T., Knotko A.V., Klimonsky S.O., Stepanov A.L.
Сборник: Abstracts of XII Int. Conf. on Nanostructured Materials
Тезисы
Год издания: 2014
Место издания: Moscow
Первая страница: 988
Последняя страница: 988
Аннотация: Method of seeded growth of narrowly dispersed SiO2 microspheres of any desirable diameter (100 < D < 500 nm) has been improved and colloidal crystal films of different thickness have been grown from synthesized microspheres. The proposed method of seeded growth has a high growth rate of the microspheres at room temperature allowing doubling of their diameter every 3 hours and the standard deviation of the diameters is less than 4% for D > 200 nm. Obtained SiO2 colloidal solutions can be directly used for growing of colloidal crystal films by vertical deposition method. Conditions for ultrathin (containing 1 or 2 close packed layers of microspheres) films growth have been established. The monolayer films have been used as microsphere masks for high dose low energy implantation of Ag+ or Cu+ ions into the glass substrates. Such process is promising for two dimensional diffraction gratings fabrication.
Добавил в систему: Климонский Сергей Олегович

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