Pulsed laser deposition of hard and superhard carbon thin films from C60 targetsстатья
Статья опубликована в высокорейтинговом журнале
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Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 19 декабря 2014 г.
Аннотация:In the present study, carbon films were deposited by a pulsed laser deposition method. A C60 fullerene target
has been irradiated by a frequency doubled Nd:YAG laser with a pulse duration of 7 ns. The carbon films
grown on Si(111) substrates at different substrate deposition temperatures (30, 300 and 500 °C) were
characterized by Raman, X-ray Photoelectron and X-ray Auger Electron Spectroscopies, Energy Dispersive X-Ray
Diffraction, Scanning Electron and Atomic Force Microscopies, and Vickers microhardness technique. The
composition, structure, morphology andmechanical properties of films were found to be strongly dependent on
the substrate temperature. At 30 °C and 300 °C deposition temperature, superhard and hard diamond-like films
have been obtained, respectively. In the case of 500 °C deposition, a hard film, composed of crystalline C60 and
diamond-like carbon, has been prepared.