On the Removal of a-C:H Films Deposited onto Mo, Mo Oxidation, and MoOx Reduction in O-2 and D-2 Dischargesстатья
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Дата последнего поиска статьи во внешних источниках: 3 декабря 2017 г.
Аннотация:The peculiarities inherent to a-C: H film removal, Mo oxidation in a flowing glow discharge of oxygen, and molybdenum-oxide reduction in deuterium discharge are investigated at T = 300-320 K. After carbon is removed under O-2 discharge conditions, a steady-state MoO3 layer with a limiting thickness of 2530 nm is formed on large-block molybdenum with the predominant orientation Mo(110). Oxide films are reduced in deuterium plasma at a selective sputtering yield on the order of 0.01 O atom/D-2(+) ion. If the interior Mo surfaces of a thermonuclear reactor are cleaned of hydrocarbon sediments via oxygen discharge, the working chamber must be additionally exposed to deuterium plasma for 8-10 h to remove oxygen from the generated alpha-MoO3 layers with the greatest possible oxygen content of 4-4.5 mu g/cm(2).