In situ plasma diagnostics for chemical vapor deposition of nano-carbon thin film materialsстатья
Статья опубликована в высокорейтинговом журнале
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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Аннотация:We report on the study of nano-carbon film deposition by in situ measuring of the optical emission and electrical parameters of the d.c. discharge in a methane-hydrogen gas mixture. By changing the deposition process parameters over a wide range, we obtain a variety of carbon thin film materials, the structure and composition of which are qualitatively characterized by a number of methods including the Raman and electron microscopy. The obtained results show the presence of H-, H-2-, CH-, and C-2-activated species in the discharge plasma. These species play a decisive role in the formation of nano-carbon graphite-like films including carbon nanotubes, and in carbon condensation in gas phase. We propose a model that describes the formation of graphitic nanostructured carbon films in the C-2-dimers enriched plasma. (C) 2003 Elsevier B.V. All rights reserved.