Effect of porosity and pore size on dielectric constant of organosilicate based low-k films: An analytical approachстатья
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Дата последнего поиска статьи во внешних источниках: 28 ноября 2017 г.
Аннотация:An analytical approach allowing to analyze effect of porosity, pore size, and interconnectivity on
dielectric constant of organosilicate based low-k materials is developed. Within the framework of this approach, a good agreement between the calculated and experimentally measured dielectric constants for several porogen (template) based organosilicate glasses low-k films is demonstrated. It is shown that the best agreement between the calculated and measured k-values corresponds to low-k structure with CH3 groups localized on pore wall surface. The results also demonstrate a good agreement with recently published results of similar analysis based on numerical approach.