Аннотация:Experimental measurements of plasma parameters in dual frequency (DF) capacitively coupled Ar
discharge were performed for gas pressure of 20, 45 and 100 mTorr and frequency relations
1.76 MHz – 81 MHz and 13.56 MHz – 81 MHz. Results on the electron concentration as a
function of low-frequency source power for a fixed power of high-frequency source are presented.
On the base of these results gas pressure range for the so-called “frequency decoupling” is
obtained. Effect of non-additive electron density increasing and power redistribution in DF
discharges is discussed.